The Study on the Determination of Proximity Parameters and Proximity Effect Correction in Electron Beam Lithography
碩士 === 國立交通大學 === 應用化學研究所 === 85 === As the critical dimensions of integrated circuit technology continue to shrink, the E-beam proximity effect correction is indispensable for precise line width control of mask. Using simple and precise experiment method to carry out E-beam proximity effect cor...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60586433993911693663 |