Study of effects of the surface cleaning and gate structure on gate oxide
碩士 === 國立交通大學 === 電子工程學系 === 85 === The quality of gate oxide is the very important key point for MOSFET. Inthis thesis,the effects of the wafer surface clean and gate structure on gate oxide will be studied. In chapter 2,we improved the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84758281910133855495 |