A Study on the Patterning of X-ray Mask
碩士 === 國立交通大學 === 電子工程學系 === 85 === It is the purpose of this thesis to develop the absorber patterning ofx-ray mask required in x-ray lithography. The tungsten film is adopted as absorbers. The satisfactory recipes for sputtering low-stres...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/97575713939489536630 |