Thermal stability and resistance behavior of nickel and cobalt silicide
碩士 === 國立交通大學 === 電子工程學系 === 85 === In this thesis, we study the thermal stability and sheet resistance behavior of Nickel and Cobalt silicide. Moreover, Silicide induced device degradations such as polycide gate oxide degradation and junct...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84547434376087010550 |