Study of temperature sensing system of rapid thermal processing
碩士 === 國立交通大學 === 控制工程系 === 85 === In this thesis, we surveyed the temperature sensing system of rapid thermalprocessing(RTP). The main problems of RTP are the uniformity and repeatability of wafer temperaturein the process of manufacturing. In order to o...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37389185359341669066 |
| Summary: | 碩士 === 國立交通大學 === 控制工程系 === 85 === In this thesis, we surveyed the temperature sensing system of
rapid thermalprocessing(RTP). The main problems of RTP are the
uniformity and repeatability of wafer temperaturein the process
of manufacturing. In order to overcome these problems, closed-
loop temperature control of RTPsystem is required. The
temperature sensing system is the key technology for control
system design.We developed in this thesis a wafer temperature
sensing system using infrared temperature sensor. A method for
on-line emissivity compensation was proposed. Experimental
resultsshow that our method can reduce the error caused by
temperature dependent variation in emissivity effectively.
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