Study of Impacts of Plasma Hydrogenation and Back-End Integrated Processes on Polysilicon TFT Characteristics
博士 === 國立成功大學 === 電機工程研究所 === 85 ===
Main Authors: | Lee, Kan Yuan, 李泔原 |
---|---|
Other Authors: | Yean Kuen Fang |
Format: | Others |
Language: | en_US |
Published: |
1997
|
Online Access: | http://ndltd.ncl.edu.tw/handle/78486065797044249149 |
Similar Items
-
Study of hydrogen plasma passivation effects on low-temperature polysilicon TFT's
by: Wei-Song Chang, et al.
Published: (1994) -
An empirical leakage current model of Polysilicon TFT's
by: 鄭銘龍
Published: (2005) -
Study of the Polysilicon TFT's for Static Random Access Memories
by: Horng-Jer Shiue, et al.
Published: (1994) -
Pattern dependencies in the plasma etching of polysilicon
by: Dalton, Timothy Joseph
Published: (2005) -
Characteristics of CVD TEOS Oxide Deposited on Disilane Polysilicon and Stacked Polysilicon Films
by: Won-Der Chen, et al.
Published: (1999)