Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films Using Borontrichloride and Ammonia.
碩士 === 國立成功大學 === 材料科學(工程)學系 === 85 === ABSTRACT Thermodynamic analysis of boron nitride(BN) films from borontrichloride(BCl3)-ammonia(NH3) reaction system are studied in this thesis. From stoichiometric algorithm for chemical equilibrium,...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02162186288267224827 |