The Study of Interface of Dielectric-Semiconductor(HfO2-Si) for IC*s Memory Application

The Study of Interface of Dielectric-Semiconductor(HfO2-Si) for IC*s Memory Application

碩士 === 國立成功大學 === 材料科學(工程)學系 === 85 ===

Bibliographic Details
Main Authors:	Cherng, Jenq Charng, 城正長
Other Authors:	Wen-Ta Tsai, Ju-Tung Lee
Format:	Others
Language:	zh-TW
Published:	1997
Online Access:	http://ndltd.ncl.edu.tw/handle/93628344586602423813

Description
Summary:	碩士 === 國立成功大學 === 材料科學(工程)學系 === 85 ===