Diffractive System Design via Iterative algorithm

• Main Authors: Lance Cheng, 程學輝
• Other Authors: Allen J. Whang
• Format: Others
• Language: zh-TW
• Published: 1996
• Online Access: http://ndltd.ncl.edu.tw/handle/84075152251902159926

碩士 === 國立臺灣科技大學 === 電子工程學系 === 84 === As integrated circuit technology continues to push further into the submicrometer regime, considerable effort has been devoted to finding means of extending the resolution limits of optical lithographic system. We would like to determine an input (mask) to the imaging operator that results in an image that is close to the prescribed image. We propose a computationally iterative algorithm for the fast design of masks for arbitrary two-dimensional patterns. This iterative approach maintain arbitrary phase and amplitude to iterate and get some compensation for the resolution-limiting effects of optical diffraction. We obtain the result with resolution as good as the conventional phase-shift mask technology.