A study of high dielectric constant Ta2O5 for DRAM applications

A study of high dielectric constant Ta2O5 for DRAM applications

碩士 === 國立清華大學 === 電機工程研究所 === 84 ===

Bibliographic Details
Main Authors:	Fu-Chien Chiu, 邱福千
Other Authors:	Joseph Ya-min Lee
Format:	Others
Language:	zh-TW
Published:	1996
Online Access:	http://ndltd.ncl.edu.tw/handle/74875087374375663033

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