A study of high dielectric constant Ta2O5 for DRAM applications

碩士 === 國立清華大學 === 電機工程研究所 === 84 ===

Bibliographic Details
Main Authors: Fu-Chien Chiu, 邱福千
Other Authors: Joseph Ya-min Lee
Format: Others
Language:zh-TW
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/74875087374375663033
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spelling ndltd-TW-084NTHU04420972016-07-13T04:10:35Z http://ndltd.ncl.edu.tw/handle/74875087374375663033 A study of high dielectric constant Ta2O5 for DRAM applications 高介電常數氧化鉭在動態隨機存取記憶體之應用 Fu-Chien Chiu 邱福千 碩士 國立清華大學 電機工程研究所 84 Joseph Ya-min Lee 李雅明 1996 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 電機工程研究所 === 84 ===
author2 Joseph Ya-min Lee
author_facet Joseph Ya-min Lee
Fu-Chien Chiu
邱福千
author Fu-Chien Chiu
邱福千
spellingShingle Fu-Chien Chiu
邱福千
A study of high dielectric constant Ta2O5 for DRAM applications
author_sort Fu-Chien Chiu
title A study of high dielectric constant Ta2O5 for DRAM applications
title_short A study of high dielectric constant Ta2O5 for DRAM applications
title_full A study of high dielectric constant Ta2O5 for DRAM applications
title_fullStr A study of high dielectric constant Ta2O5 for DRAM applications
title_full_unstemmed A study of high dielectric constant Ta2O5 for DRAM applications
title_sort study of high dielectric constant ta2o5 for dram applications
publishDate 1996
url http://ndltd.ncl.edu.tw/handle/74875087374375663033
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