The effect of dc-bias on the processing a-C:H by RF PECVD
碩士 === 國立清華大學 === 材料科學(工程)研究所 === 84 ===
Main Authors: | Wu, Tse Hsyan, 吳則賢 |
---|---|
Other Authors: | Chou Lin Hsin |
Format: | Others |
Language: | zh-TW |
Published: |
1996
|
Online Access: | http://ndltd.ncl.edu.tw/handle/84459793137957902488 |
Similar Items
-
HARDNESS OF HYBRID PVD-PECVD W-C:H COATINGS VS. SUBSTRATE TYPE
by: František Lofaj, et al.
Published: (2020-06-01) -
Estudo do comportamento eletrico de dispositivos semicondutores fabricados com filmes finos de a-C:H e a-C:H:N obtidos por RF-PECVD
by: Pires, Rodrigo Porto
Published: (2003) -
Carbon nanosheets and carbon nanotubes by RF PECVD
by: Zhu, Mingyao
Published: (2006) -
Hydrogenated Amorphous Silicon Films Prepared by RF SiH4-PECVD System
by: Chieh Li, et al.
Published: (2009) -
Investigation on Silicon Heterojunction Layers Prepared by RF-PECVD
by: IAN-WEI CHEN, et al.
Published: (2010)