Studies of Anodic Alumina Formed on Sputtered Thin Al Films
博士 === 國立交通大學 === 電子研究所 === 84 === A systematic research about the effect of various processing parameters on the anodic oxide formation on Al thin films depos- ted on Si wafer coated with thermal oxide and borophosphosilica- te glass (BPSG) has been cond...
Main Authors: | Chiu ,Re-Long, 邱瑞隆 |
---|---|
Other Authors: | Peeng-Heng Chang |
Format: | Others |
Language: | en_US |
Published: |
1995
|
Online Access: | http://ndltd.ncl.edu.tw/handle/44661885211218961567 |
Similar Items
-
Processing and characterization of RF sputtered alumina thin films.
by: Gignac, Lynne Marie.
Published: (1988) -
Synthesis and Characterisation of Magnetron Sputtered Alumina-Zirconia Thin Films
by: Trinh, David Huy
Published: (2006) -
Nanocrystalline Alumina-Zirconia Thin Films Grown by Magnetron Sputtering
by: Trinh, David Huy
Published: (2008) -
The Design and Modification of a Sputter System for DC Reactive Sputtering of Alumina and Zirconia Thin Films
by: Ho, Diane Van
Published: (2011) -
Alumina、Titania and Aluminum titaniate Thin Films Prepared by Magnetron Sputtering
by: 曾國華
Published: (2001)