CVD Epitaxial Deposition in a Vertical Barrel reactor: Process Modeling Using Fuzzy Logic Models
碩士 === 國立交通大學 === 控制工程系 === 84 === A CVD epitaxial deposition process modeling using fuzzy logic models has beenproposed. The algorithm starts with cluster estimation method and back propagationalgorithm to construct a number of modeling st...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88281333592363259074 |
| Summary: | 碩士 === 國立交通大學 === 控制工程系 === 84 === A CVD epitaxial deposition process modeling using fuzzy logic
models has beenproposed. The algorithm starts with cluster
estimation method and back propagationalgorithm to construct a
number of modeling structures from the training data.A decision
rule based on the multiple correlation factor is used to obtain
theoptimum structure of the fuzzy model using the testing data.
Upon the optimumstructure has been reached, the gradient-descent
method is used to refine theparameters of the final fuzzy model
using both training and testing data. Thealgorithm has been
applied to various nonlinear functions and a verticl
chemicalvapor deposition process. The results demonstrate the
efficiency and effective-ness of the proposed fuzzy logic model
in comparison with existing fuzzy logicmodels and artificial
neural network models.
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