Growth Characteristics and Properties of TiN Coatings by Chemical Vapor Deposition

Growth Characteristics and Properties of TiN Coatings by Chemical Vapor Deposition

博士 === 國立成功大學 === 材料科學(工程)研究所 === 84 === The TiN films were deposited on graphite, SKD61, cemented carbide, and sintered Si3N4 substrates respectively by using TiCl4, N2, and H2 as reaction gases in a conventional chemical vapor deposition (CVD) system at...

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Bibliographic Details
Main Authors:	Hsyi-En Cheng, 鄭錫恩
Other Authors:	Min-Hsiung Hon
Format:	Others
Language:	zh-TW
Published:	1996
Online Access:	http://ndltd.ncl.edu.tw/handle/51014542612703472010

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