| Summary: | 碩士 === 輔仁大學 === 物理學系 === 84 === The application of Fe-Ni thin films as computer memory and
logic elements isvery valuable and has been studied extensively
in recent years. For the composition of Fe20Ni80, also known as
Permalloy, it is the most remarkableone. With the method of
thermal evaporation, we have made Fe-Ni thin films invarious
thickness ranges and in neighboring compositions around that of
Permalloy for domain observation and other experiments. The
thickness of thin films was determined by Dektak3, a depth
profile measuring system. The real composition of thin films was
measured with SEM-EDS(Scanning Electron Microscopy - Energy
Dispersive X-ray Spectrometer). The observation of domain
structure and domain walls in thin films was made by the Bitter
pattern method. From experimental data and theoretical
calculations, we have studied the thickness and composition
dependence of domain wall energy respectively. It wasfound that
the domain wall energy density of Fe-Ni thin films is about 1-20
erg/cm2. For the case of Permalloy, our experimental data about
the film thickness dependence of domain wall energy are in
agreement with that from theoretical predictions. In the case of
other compositions, the minimum value of domain wall energy is
around the composition of Permalloy.
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