Growth of ALN Films by Reactive RF Sputtering
碩士 === 國立中山大學 === 電機工程研究所 === 83 === C-axis oriented aluminum nitride (AlN) thin films on different substrates, such as Corning glass, Si(100), GaAs(100), LiNbO3, SiO2/Si(100), are prepared by reactive RF magnetron sputtering The dependence of highly c-...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/69354251443050827144 |