Effects of Low Energy Plasma Processes on Hydrogenated Silicon Oxide Deposition in RF Magnetron Discharges
博士 === 國立中央大學 === 物理與天文學研究所 === 83 === The effects of low energy plasma induced (or enhanced) processes on the hydrogenated silicon oxide thin film deposition are investigated in an rf magnetron plasma system using an in situ, real time single wavelength...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1995
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/92063526421086727722 |