Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application

博士 === 國立交通大學 === 電子研究所 === 83 ===

Bibliographic Details
Main Author: 邱榮照
Other Authors: Cai, Chun-Jin
Format: Others
Language:zh-TW
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/91148812354627573572
id ndltd-TW-083NCTU6430102
record_format oai_dc
spelling ndltd-TW-083NCTU64301022015-10-13T12:53:41Z http://ndltd.ncl.edu.tw/handle/91148812354627573572 Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application 銅化學氣相沉積技術開發與銅金屬化系統之可靠度研究 邱榮照 博士 國立交通大學 電子研究所 83 Cai, Chun-Jin 陳茂傑 1994 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 博士 === 國立交通大學 === 電子研究所 === 83 ===
author2 Cai, Chun-Jin
author_facet Cai, Chun-Jin
邱榮照
author 邱榮照
spellingShingle 邱榮照
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
author_sort 邱榮照
title Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
title_short Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
title_full Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
title_fullStr Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
title_full_unstemmed Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
title_sort development of cu cvd technology and reliability issue of cu metallization relevant to ulsi application
publishDate 1994
url http://ndltd.ncl.edu.tw/handle/91148812354627573572
work_keys_str_mv AT qiūróngzhào developmentofcucvdtechnologyandreliabilityissueofcumetallizationrelevanttoulsiapplication
AT qiūróngzhào tónghuàxuéqìxiāngchénjījìshùkāifāyǔtóngjīnshǔhuàxìtǒngzhīkěkàodùyánjiū
_version_ 1716869022970019840