Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
博士 === 國立交通大學 === 電子研究所 === 83 ===
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1994
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Online Access: | http://ndltd.ncl.edu.tw/handle/91148812354627573572 |
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ndltd-TW-083NCTU64301022015-10-13T12:53:41Z http://ndltd.ncl.edu.tw/handle/91148812354627573572 Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application 銅化學氣相沉積技術開發與銅金屬化系統之可靠度研究 邱榮照 博士 國立交通大學 電子研究所 83 Cai, Chun-Jin 陳茂傑 1994 學位論文 ; thesis 0 zh-TW |
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zh-TW |
format |
Others
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博士 === 國立交通大學 === 電子研究所 === 83 ===
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author2 |
Cai, Chun-Jin |
author_facet |
Cai, Chun-Jin 邱榮照 |
author |
邱榮照 |
spellingShingle |
邱榮照 Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
author_sort |
邱榮照 |
title |
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
title_short |
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
title_full |
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
title_fullStr |
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
title_full_unstemmed |
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
title_sort |
development of cu cvd technology and reliability issue of cu metallization relevant to ulsi application |
publishDate |
1994 |
url |
http://ndltd.ncl.edu.tw/handle/91148812354627573572 |
work_keys_str_mv |
AT qiūróngzhào developmentofcucvdtechnologyandreliabilityissueofcumetallizationrelevanttoulsiapplication AT qiūróngzhào tónghuàxuéqìxiāngchénjījìshùkāifāyǔtóngjīnshǔhuàxìtǒngzhīkěkàodùyánjiū |
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1716869022970019840 |