Chemical Vapor Deposition of Tantalum Nitride Diffusion arrier for Copper Metallization
碩士 === 國立交通大學 === 應用化學系 === 83 === The imido complexes Ta(=NR)Cl3Py2 and Ta(=NR)(NEt2)3 (R=tBu, iPr,nPr) were successful synthesized .Ta(=NBu)(NEt2)3 was used as a single-source precursor to deposition thin films on Si, SiO2/Si,in a low-pr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/87769440070049750499 |