Study on Porous Silicon and Its Application on Light-Emitting Diode

碩士 === 國立成功大學 === 電機工程研究所 === 83 === Due to the indirect energy gap and its energy gap is only .11 ev at room temperature, silicon shows a very poor opticaladiative efficiency and only produces light ouside the visibleange. However, by util...

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Main Authors: Yuong-Chih Tsai, 蔡永智
Other Authors: Shui-Jinn Wang
Format: Others
Language:en_US
Published: 1995
Online Access:http://ndltd.ncl.edu.tw/handle/47285601133087868492
id ndltd-TW-083NCKU0442031
record_format oai_dc
spelling ndltd-TW-083NCKU04420312015-10-13T12:53:36Z http://ndltd.ncl.edu.tw/handle/47285601133087868492 Study on Porous Silicon and Its Application on Light-Emitting Diode 多孔矽材料之研製及其在發光元件的應用 Yuong-Chih Tsai 蔡永智 碩士 國立成功大學 電機工程研究所 83 Due to the indirect energy gap and its energy gap is only .11 ev at room temperature, silicon shows a very poor opticaladiative efficiency and only produces light ouside the visibleange. However, by utilizing quantum confinement effect, roomemperature visible PL can be observed from porous Si(PS) repared by electrochemical etching. The quantum confinementffect is found resulting in widening the bandgap andransferring the indirect bandgap into the direct bandgap. In this thesis, the morphology of PS is investigatednd the PS prepared under different anodization conditionsxhibit different morphologies are presented. By properlydjusting the anodization parameters, such as the anodic time,urrent density, the concentrations of HF solution, and lightllumination during anodization, etc., the porosity in PS cane well-controlled.It is found that the PL peak position showsblueshift with increasing the porosity, which can be explainedy the quantum confinement effect.Furthermore, the Raman spectrumeveals that there are microstructures in the PS and shows aownshift of the Raman peak accompanied by brodening theinewidth with reducing the sizes of the microstructures. Theseesults confirm that the quantum confinement effect do play ann important role in the origin of the luminescence from PS. In the device applications, the light-emitting diode basedn porous Si (PS-LED) has been successfully fabricated. Finally,he selected-area PS and PS-LED have also been fabricateduccessfully with conventional photolithography.Further work isrgently needed to find possibility for implementing Si-basedEIC with conventional photolithographic technique in the nearuture. Shui-Jinn Wang 王水進 1995 學位論文 ; thesis 1 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 電機工程研究所 === 83 === Due to the indirect energy gap and its energy gap is only .11 ev at room temperature, silicon shows a very poor opticaladiative efficiency and only produces light ouside the visibleange. However, by utilizing quantum confinement effect, roomemperature visible PL can be observed from porous Si(PS) repared by electrochemical etching. The quantum confinementffect is found resulting in widening the bandgap andransferring the indirect bandgap into the direct bandgap. In this thesis, the morphology of PS is investigatednd the PS prepared under different anodization conditionsxhibit different morphologies are presented. By properlydjusting the anodization parameters, such as the anodic time,urrent density, the concentrations of HF solution, and lightllumination during anodization, etc., the porosity in PS cane well-controlled.It is found that the PL peak position showsblueshift with increasing the porosity, which can be explainedy the quantum confinement effect.Furthermore, the Raman spectrumeveals that there are microstructures in the PS and shows aownshift of the Raman peak accompanied by brodening theinewidth with reducing the sizes of the microstructures. Theseesults confirm that the quantum confinement effect do play ann important role in the origin of the luminescence from PS. In the device applications, the light-emitting diode basedn porous Si (PS-LED) has been successfully fabricated. Finally,he selected-area PS and PS-LED have also been fabricateduccessfully with conventional photolithography.Further work isrgently needed to find possibility for implementing Si-basedEIC with conventional photolithographic technique in the nearuture.
author2 Shui-Jinn Wang
author_facet Shui-Jinn Wang
Yuong-Chih Tsai
蔡永智
author Yuong-Chih Tsai
蔡永智
spellingShingle Yuong-Chih Tsai
蔡永智
Study on Porous Silicon and Its Application on Light-Emitting Diode
author_sort Yuong-Chih Tsai
title Study on Porous Silicon and Its Application on Light-Emitting Diode
title_short Study on Porous Silicon and Its Application on Light-Emitting Diode
title_full Study on Porous Silicon and Its Application on Light-Emitting Diode
title_fullStr Study on Porous Silicon and Its Application on Light-Emitting Diode
title_full_unstemmed Study on Porous Silicon and Its Application on Light-Emitting Diode
title_sort study on porous silicon and its application on light-emitting diode
publishDate 1995
url http://ndltd.ncl.edu.tw/handle/47285601133087868492
work_keys_str_mv AT yuongchihtsai studyonporoussiliconanditsapplicationonlightemittingdiode
AT càiyǒngzhì studyonporoussiliconanditsapplicationonlightemittingdiode
AT yuongchihtsai duōkǒngxìcáiliàozhīyánzhìjíqízàifāguāngyuánjiàndeyīngyòng
AT càiyǒngzhì duōkǒngxìcáiliàozhīyánzhìjíqízàifāguāngyuánjiàndeyīngyòng
_version_ 1716868327966507008