The investigation of the characteristic and application of the porous silicon layer
碩士 === 國立海洋大學 === 電子工程學系 === 82 === The objects of this paper focus on the fabrication and characterization of high sensitive silicon pressure sensors for measurement of gas pressure. Although the mechanic type pressure sensors hav...
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ndltd-TW-082NTOU04280242016-07-18T04:09:52Z http://ndltd.ncl.edu.tw/handle/72447409477321434059 The investigation of the characteristic and application of the porous silicon layer 多孔矽的特性及應用之研究 Gee-Wen Chou 周基淵 碩士 國立海洋大學 電子工程學系 82 The objects of this paper focus on the fabrication and characterization of high sensitive silicon pressure sensors for measurement of gas pressure. Although the mechanic type pressure sensors have been used widely, the silicon pressure sensors have excellent characteristics, such as small size, high sensitivity and the possibility of monolithic integration of electronic devices, which may be used more attractively in the future. In semiconductors, the numbers of charge carriers are expected to change by applied stress, which causes the energy gap change between the valence and conduction band. Therefore, the resistivity would change. This is one of the best features for silicon pressure sensors utilizing piezo- resistance effect for measuring very low pressure. Silicon pressure sensors consist of a thin square diaphragm as an elastic material and four piezoresistive guage resistors which are made by diffusing impurities into the diaphragm surface. When pressure is applied to the diaphragm, the guage resistance will change due to the piezoresistance effect. In this experiement, the parameters which may influence the characteristics of sensors including the diaphragm thickness, piezoresistors layout, dopant concentration, junction depth and environmental temperature etc. are discussed From the results of this experiment, it can be found that on (100) n type Si substrate, with the diaphragm is thinner and the junction depth is shallower, one would obtain the highest sensitivity as the piezoresistors are along the [110] direction. Chung-Cheng Chang 張忠誠 1994 學位論文 ; thesis 85 zh-TW |
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碩士 === 國立海洋大學 === 電子工程學系 === 82 === The objects of this paper focus on the fabrication and
characterization of high sensitive silicon pressure sensors
for measurement of gas pressure. Although the mechanic type
pressure sensors have been used widely, the silicon pressure
sensors have excellent characteristics, such as small size,
high sensitivity and the possibility of monolithic integration
of electronic devices, which may be used more attractively in
the future. In semiconductors, the numbers of charge carriers
are expected to change by applied stress, which causes the
energy gap change between the valence and conduction band.
Therefore, the resistivity would change. This is one of the
best features for silicon pressure sensors utilizing piezo-
resistance effect for measuring very low pressure. Silicon
pressure sensors consist of a thin square diaphragm as an
elastic material and four piezoresistive guage resistors which
are made by diffusing impurities into the diaphragm
surface. When pressure is applied to the diaphragm, the guage
resistance will change due to the piezoresistance effect. In
this experiement, the parameters which may influence the
characteristics of sensors including the diaphragm
thickness, piezoresistors layout, dopant concentration,
junction depth and environmental temperature etc. are discussed
From the results of this experiment, it can be found that on
(100) n type Si substrate, with the diaphragm is thinner and
the junction depth is shallower, one would obtain the highest
sensitivity as the piezoresistors are along the [110] direction.
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author2 |
Chung-Cheng Chang |
author_facet |
Chung-Cheng Chang Gee-Wen Chou 周基淵 |
author |
Gee-Wen Chou 周基淵 |
spellingShingle |
Gee-Wen Chou 周基淵 The investigation of the characteristic and application of the porous silicon layer |
author_sort |
Gee-Wen Chou |
title |
The investigation of the characteristic and application of the porous silicon layer |
title_short |
The investigation of the characteristic and application of the porous silicon layer |
title_full |
The investigation of the characteristic and application of the porous silicon layer |
title_fullStr |
The investigation of the characteristic and application of the porous silicon layer |
title_full_unstemmed |
The investigation of the characteristic and application of the porous silicon layer |
title_sort |
investigation of the characteristic and application of the porous silicon layer |
publishDate |
1994 |
url |
http://ndltd.ncl.edu.tw/handle/72447409477321434059 |
work_keys_str_mv |
AT geewenchou theinvestigationofthecharacteristicandapplicationoftheporoussiliconlayer AT zhōujīyuān theinvestigationofthecharacteristicandapplicationoftheporoussiliconlayer AT geewenchou duōkǒngxìdetèxìngjíyīngyòngzhīyánjiū AT zhōujīyuān duōkǒngxìdetèxìngjíyīngyòngzhīyánjiū AT geewenchou investigationofthecharacteristicandapplicationoftheporoussiliconlayer AT zhōujīyuān investigationofthecharacteristicandapplicationoftheporoussiliconlayer |
_version_ |
1718353443061497856 |