A study of the Rapid Thermal Chemical Vapor Deposition for Applications in Integrated Circuits
碩士 === 國立交通大學 === 電子研究所 === 82 === In this work, the characteristics of rapid thermal chemical vapor deposition of undoped polysilicon have been studied. The effects of deposition temperature, pressure and reaction gas flow rate on the uni...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/14429528451083535212 |