Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films

碩士 === 國立交通大學 === 電子物理學系 === 82 === The epitaxial growth mechanism of high Tc Tl-based 2223 phase superconducting thin films were investigated. By using two -step method including DC-sputering and post-annealing, the effect of annealing tem...

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Main Authors: J.J. Li, 黎俊基
Other Authors: T.M. Uen;Y.S. Gou
Format: Others
Language:zh-TW
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/38257840438015764192
id ndltd-TW-082NCTU0429010
record_format oai_dc
spelling ndltd-TW-082NCTU04290102016-07-18T04:09:35Z http://ndltd.ncl.edu.tw/handle/38257840438015764192 Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films 磊晶狀鉈系2223相高溫超導薄膜製作研究 J.J. Li 黎俊基 碩士 國立交通大學 電子物理學系 82 The epitaxial growth mechanism of high Tc Tl-based 2223 phase superconducting thin films were investigated. By using two -step method including DC-sputering and post-annealing, the effect of annealing temperature, dwell time and thin film compen -sation which are the most important parameters to thin film epitaxial growth were studied. From optical microscope, SEM, EDX and XRD,we found the growth step of 2223 phase epitaxial thin films. The optimal annealing dwell time is 25 minutes. We found that high Jc thin films would be grown with furnace-cooling process, the suitable thin film compensation improves an optimal growth environment. T.M. Uen;Y.S. Gou 溫增明;郭義雄 1994 學位論文 ; thesis 59 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 電子物理學系 === 82 === The epitaxial growth mechanism of high Tc Tl-based 2223 phase superconducting thin films were investigated. By using two -step method including DC-sputering and post-annealing, the effect of annealing temperature, dwell time and thin film compen -sation which are the most important parameters to thin film epitaxial growth were studied. From optical microscope, SEM, EDX and XRD,we found the growth step of 2223 phase epitaxial thin films. The optimal annealing dwell time is 25 minutes. We found that high Jc thin films would be grown with furnace-cooling process, the suitable thin film compensation improves an optimal growth environment.
author2 T.M. Uen;Y.S. Gou
author_facet T.M. Uen;Y.S. Gou
J.J. Li
黎俊基
author J.J. Li
黎俊基
spellingShingle J.J. Li
黎俊基
Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
author_sort J.J. Li
title Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
title_short Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
title_full Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
title_fullStr Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
title_full_unstemmed Epitaxial growth of high Tc Tl-based 2223 phase superconducting thin films
title_sort epitaxial growth of high tc tl-based 2223 phase superconducting thin films
publishDate 1994
url http://ndltd.ncl.edu.tw/handle/38257840438015764192
work_keys_str_mv AT jjli epitaxialgrowthofhightctlbased2223phasesuperconductingthinfilms
AT líjùnjī epitaxialgrowthofhightctlbased2223phasesuperconductingthinfilms
AT jjli lěijīngzhuàngshīxì2223xiānggāowēnchāodǎobáomózhìzuòyánjiū
AT líjùnjī lěijīngzhuàngshīxì2223xiānggāowēnchāodǎobáomózhìzuòyánjiū
_version_ 1718351636538064896