Characteristics of Ta�烙�� films formed by oxidation of Ta films

碩士 === 國立交通大學 === 材料工程研究所 === 80 ===

Bibliographic Details
Main Authors: WU, FANG-JY, 吳芳枝
Other Authors: CHANG, BING-HENG
Format: Others
Language:zh-TW
Published: 1992
Online Access:http://ndltd.ncl.edu.tw/handle/96467513860253494011
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spelling ndltd-TW-080NCTU21590012015-10-13T14:16:54Z http://ndltd.ncl.edu.tw/handle/96467513860253494011 Characteristics of Ta�烙�� films formed by oxidation of Ta films 加熱氧化金屬鉭膜而形成的五氧化二鉭膜之特性 WU, FANG-JY 吳芳枝 碩士 國立交通大學 材料工程研究所 80 CHANG, BING-HENG 張秉衡 1992 學位論文 ; thesis 31 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 材料工程研究所 === 80 ===
author2 CHANG, BING-HENG
author_facet CHANG, BING-HENG
WU, FANG-JY
吳芳枝
author WU, FANG-JY
吳芳枝
spellingShingle WU, FANG-JY
吳芳枝
Characteristics of Ta�烙�� films formed by oxidation of Ta films
author_sort WU, FANG-JY
title Characteristics of Ta�烙�� films formed by oxidation of Ta films
title_short Characteristics of Ta�烙�� films formed by oxidation of Ta films
title_full Characteristics of Ta�烙�� films formed by oxidation of Ta films
title_fullStr Characteristics of Ta�烙�� films formed by oxidation of Ta films
title_full_unstemmed Characteristics of Ta�烙�� films formed by oxidation of Ta films
title_sort characteristics of ta�烙�� films formed by oxidation of ta films
publishDate 1992
url http://ndltd.ncl.edu.tw/handle/96467513860253494011
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