Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition

博士 === 國立成功大學 === 電機工程研究所 === 80 ===

Bibliographic Details
Main Authors: HUANG, ZHI-REN, 黃志仁
Other Authors: SU, YAN-SHEN
Format: Others
Language:zh-TW
Published: 1992
Online Access:http://ndltd.ncl.edu.tw/handle/93784026759678357442
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spelling ndltd-TW-080NCKU24420932016-02-17T04:16:59Z http://ndltd.ncl.edu.tw/handle/93784026759678357442 Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition 以光激化學氣相沉積法製造金氧半結構元件之研究 HUANG, ZHI-REN 黃志仁 博士 國立成功大學 電機工程研究所 80 SU, YAN-SHEN 蘇炎坤 1992 學位論文 ; thesis 161 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 博士 === 國立成功大學 === 電機工程研究所 === 80 ===
author2 SU, YAN-SHEN
author_facet SU, YAN-SHEN
HUANG, ZHI-REN
黃志仁
author HUANG, ZHI-REN
黃志仁
spellingShingle HUANG, ZHI-REN
黃志仁
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
author_sort HUANG, ZHI-REN
title Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
title_short Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
title_full Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
title_fullStr Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
title_full_unstemmed Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
title_sort metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
publishDate 1992
url http://ndltd.ncl.edu.tw/handle/93784026759678357442
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AT huángzhìrén yǐguāngjīhuàxuéqìxiāngchénjīfǎzhìzàojīnyǎngbànjiégòuyuánjiànzhīyánjiū
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