Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition
博士 === 國立成功大學 === 電機工程研究所 === 80 ===
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Online Access: | http://ndltd.ncl.edu.tw/handle/93784026759678357442 |
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ndltd-TW-080NCKU24420932016-02-17T04:16:59Z http://ndltd.ncl.edu.tw/handle/93784026759678357442 Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition 以光激化學氣相沉積法製造金氧半結構元件之研究 HUANG, ZHI-REN 黃志仁 博士 國立成功大學 電機工程研究所 80 SU, YAN-SHEN 蘇炎坤 1992 學位論文 ; thesis 161 zh-TW |
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zh-TW |
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Others
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博士 === 國立成功大學 === 電機工程研究所 === 80 ===
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author2 |
SU, YAN-SHEN |
author_facet |
SU, YAN-SHEN HUANG, ZHI-REN 黃志仁 |
author |
HUANG, ZHI-REN 黃志仁 |
spellingShingle |
HUANG, ZHI-REN 黃志仁 Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
author_sort |
HUANG, ZHI-REN |
title |
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
title_short |
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
title_full |
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
title_fullStr |
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
title_full_unstemmed |
Metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
title_sort |
metal-oxide-semiconductor structure devices preparecd by photo-chemical vapor deposition |
publishDate |
1992 |
url |
http://ndltd.ncl.edu.tw/handle/93784026759678357442 |
work_keys_str_mv |
AT huangzhiren metaloxidesemiconductorstructuredevicespreparecdbyphotochemicalvapordeposition AT huángzhìrén metaloxidesemiconductorstructuredevicespreparecdbyphotochemicalvapordeposition AT huangzhiren yǐguāngjīhuàxuéqìxiāngchénjīfǎzhìzàojīnyǎngbànjiégòuyuánjiànzhīyánjiū AT huángzhìrén yǐguāngjīhuàxuéqìxiāngchénjīfǎzhìzàojīnyǎngbànjiégòuyuánjiànzhīyánjiū |
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1718190655055855616 |