The effects of crosslinking on the selective surface enhancement to dry development in microlithography

The effects of crosslinking on the selective surface enhancement to dry development in microlithography

碩士 === 國立交通大學 === 應用化學研究所 === 79 === AZ1350J商用正型阻劑經Deep UV曝光交聯, 浸泡C H COOK／n-Hexane有機溶液, 鉀離子易於非曝光區產生物理性附著。酚醛樹脂(Novolac) 藉Deep UV 或交聯劑(Bisazide)曝光交聯, 經110 ℃氣相HMDS矽化反應, 產生選擇性矽化。由FTIR 920cm (Ar-O-Si) 吸收峰增加與UV 270nm( 酚醛...

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Bibliographic Details
Main Authors:	ZHU,ZHENG-YU, 朱政宇
Other Authors:	LONG,WEN-AN
Format:	Others
Language:	zh-TW
Published:	1991
Online Access:	http://ndltd.ncl.edu.tw/handle/60943246543452249359

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