Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane

碩士 === 國立交通大學 === 應用化學研究所 === 79 ===

Bibliographic Details
Main Authors: LI,SHU-FEN, 李淑芬
Other Authors: QIU,XING-TIAN
Format: Others
Language:zh-TW
Published: 1991
Online Access:http://ndltd.ncl.edu.tw/handle/78532155471821490694