Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane

碩士 === 國立交通大學 === 應用化學研究所 === 79 ===

Bibliographic Details
Main Authors: LI,SHU-FEN, 李淑芬
Other Authors: QIU,XING-TIAN
Format: Others
Language:zh-TW
Published: 1991
Online Access:http://ndltd.ncl.edu.tw/handle/78532155471821490694
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spelling ndltd-TW-079NCTU25000132016-07-25T04:07:10Z http://ndltd.ncl.edu.tw/handle/78532155471821490694 Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane 以十二甲基環己矽烷低壓化學氣相沉積碳化矽薄膜 LI,SHU-FEN 李淑芬 碩士 國立交通大學 應用化學研究所 79 QIU,XING-TIAN 裘性天 1991 學位論文 ; thesis 60 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 應用化學研究所 === 79 ===
author2 QIU,XING-TIAN
author_facet QIU,XING-TIAN
LI,SHU-FEN
李淑芬
author LI,SHU-FEN
李淑芬
spellingShingle LI,SHU-FEN
李淑芬
Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
author_sort LI,SHU-FEN
title Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
title_short Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
title_full Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
title_fullStr Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
title_full_unstemmed Low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
title_sort low pressure chemical vapor deposition of silicon carbide thin films from dodecamethylcyclohexasilane
publishDate 1991
url http://ndltd.ncl.edu.tw/handle/78532155471821490694
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