Ultra-shallow junction in silicon using amorphous, polycrystalline silicon and titanium silicide as solid diffusion sources
碩士 === 國立交通大學 === 電子研究所 === 78 ===
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
1991
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Online Access: | http://ndltd.ncl.edu.tw/handle/24369954478908562778 |