Thermally stable ohmic contacts to n-GaAs with Cr and TiW diffusion barriers
碩士 === 國立交通大學 === 光電(科學)研究所 === 78 ===
Main Authors: | HUANG,JIAN-MING, 黃健銘 |
---|---|
Other Authors: | LEI,TIAN-FU |
Format: | Others |
Language: | zh-TW |
Published: |
1990
|
Online Access: | http://ndltd.ncl.edu.tw/handle/56443323149047673651 |
Similar Items
-
A study on (TiW)Six/GaAs contacts
by: JIN,XUAN, et al.
Published: (1990) -
An investigation of Tiw nitride and Tiw silicide schottky contacts to^^GaAs
by: WANG,SHENG-PING, et al.
Published: (1991) -
TiW Nitride as an Annealing Encapsulant for Si Implanted GaAs
by: KANG PO ZENG, et al.
Published: (1993) -
Thermally stable ohmic contacts to n-GaAs
by: XIA, SHAO-ZENG, et al.
Published: (1988) -
Selective Cu-CVD and TiW Diffusion Barrier for Cu Metallization
by: Kuen-Chi Juang, et al.
Published: (1994)