The fabrication of high luminous efficiency thin film electroluminescent devices with new insulating material HfO2

The fabrication of high luminous efficiency thin film electroluminescent devices with new insulating material HfO2

碩士 === 國立成功大學 === 電機工程研究所 === 78 ===

Bibliographic Details
Main Authors:	LI,JIN-WEN, 李錦文
Other Authors:	HENG,SHAN-MING-CONG
Format:	Others
Language:	zh-TW
Published:	1991
Online Access:	http://ndltd.ncl.edu.tw/handle/71353244751482578164

Similar Items

Modeling and fabrication of AC thin film electroluminescent display devices
by: Jiin-Wen Li, et al.
Published: (1995)

Deposition and characterization of HfO₂ thin films
by: Zou, Shubing
Published: (2014)

Characteristics of pure Hf target and HfO2 thin films
by: Hung-Shiuan Chen, et al.
Published: (2011)

Growth and characterization of HfON thin films with the crystal structures of HfO2
by: Lü, Bo
Published: (2011)

A study of resistive memory device containing HfO2 thin film
by: Wang, Shih-Hao, et al.
Published: (2014)

Alternating-current thin-film electroluminescent device fabrication and characterization
by: Baukol, Beau
Published: (2012)

The Fabrication and Electrical Properties of HfO2 Thin Film Capacitors and Field-Effect Transistors
by: Shih-Shing Huang, et al.
Published: (2004)

Fabrication and Characterization of HfO2 High-K Gate Insulator for Transparent ZnO Thin-Film Transistors on Glass and Plastic Substrates
by: Zong-Syun Chen, et al.
Published: (2010)

The fabrication of Zns: Tb, F thin film electroluminescent devices by sputtering
by: Liu, Chun-Xing, et al.
Published: (1991)

The Fabrication of ZnS:TbOF Thin Film Electroluminescent Device by Magnetron Sputtering
by: Yuh-Maoh Sun, et al.
Published: (1993)

The Study of ZnS:TbOF Thin Film Electroluminescent Devices with Different Stacked Insulating Layers
by: Shi-Xian Chen, et al.
Published: (1995)

Crystallization of HfO2 thin films and their influence on laser induced damage
by: Balogh-Michels Zoltán, et al.
Published: (2020-01-01)

Photodiode characteristics of HfO2 thin films prepared by magnetron sputtering
by: Chao-Feng Liu, et al.
Published: (2020-03-01)

Silicon Surface Passivation with ALCVD HfO2 Dielectric Thin Film
by: 童韻樺
Published: (2014)

The Characterization of HfO2 Thin Film Treatment by N2O
by: C.C. Ma, et al.
Published: (2001)

Impact excitation efficiency in AC-driven thin-film electroluminescent devices
by: Peter, Manuela
Published: (2012)

Thin film silicon carbide for electroluminescent devices
by: Lau, S. P.
Published: (1995)

Electroluminescent devices based on polymeric thin films
by: Young, Jung Gun
Published: (2001)

Investigate of high performance HfO2 gate dielectric thin film transistor applications
by: Chi Shiau Li, et al.
Published: (2009)

Fabrication and analysis of the mixed-structure HfO2
by: Yi-tsung Chiang, et al.
Published: (2013)

Fabrication and Characterization of HfO2 Based Resistive Random Access Memory Devices
by: Long, Branden Michael
Published: (2013)

Equivalent Circuit Model And Luminance Estimation Of Alternating- Current Thick-Film Electroluminescent Device
by: JIA-RONG SYU, et al.
Published: (2007)

Enhancement of Luminance in Powder Electroluminescent Devices by Substrates of Smooth and Transparent Cellulose Nanofiber Films
by: Shota Tsuneyasu, et al.
Published: (2021-03-01)

Investigation of High-K Material HfO2 on Metal-Insulator-Metal Capacitor
by: Shiou-Hau Hsu, et al.
Published: (2006)

HfO2/ZnO superlattice channel for transparent thin-film transistors fabricated by atomic layer deposition
by: Tsung-Han Liu, et al.
Published: (2019)

Study Suitable Electrode of Polymer Thin Film Transistor (RR-P3HT) and Gate Leakage Current Characteristics on HfO2 Gate Insulator
by: Lin Ching Wen, et al.
Published: (2007)

Evaluation of hydrogen trapping in HfO2 high-κ dielectric thin films.
by: Ukirde, Vaishali
Published: (2006)

An Investigation of High Dielectric Constant of RF-sputtered HfO2 Thin Films
by: Yeh, Chang-Moun, et al.
Published: (1997)

Bipolar resistive switching of NiO/HfO double-layer thin films
by: Yan-Cheng Huang, et al.
Published: (2016)

Optimization of HfO2 Thin Films for Gate Dielectric Applications in 2-D Layered Materials
by: Ganapathi, K Lakshmi
Published: (2018)

A Study of HfO2 as a Gate Insulator for Improving the Electrical Characteristics of Small Size Metal Oxide Thin-Film Transistors
by: Yu-Huan Deng, et al.
Published: (2016)

Investigation on PVD Deposited HfO2 Film
by: Hsiu-Wei Chang, et al.
Published: (2002)

Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
by: Xiao-Ying Zhang, et al.
Published: (2017-12-01)

Fabrication and Electrical Properties of Densified HfO2 by Rapid Thermal Annealing
by: Wen-Wei Chen, et al.
Published: (2012)

Design and Fabrication of Interdigital Nanocapacitors Coated with HfO2
by: Gabriel González, et al.
Published: (2015-01-01)

Increasing the performance of thin film electroluminescent (TFEL) devices
by: Craven, Marc Richard
Published: (2000)

Electroluminescent devices based on blended polymeric thin films
by: Widdowson, Nicholas E.
Published: (2006)

Performance studies of thin film electroluminescent (TFEL) devices
by: Sethu, Murugesan
Published: (2002)

Characteristics of ultra-thin HfO2 gate insultor
by: Chang Hong-dyi, et al.
Published: (2005)

The Study of Green Thin Film Electroluminescent Devices and ZnSe Thin Films
by: Chin-Tsar Hsu, et al.
Published: (1993)

Cannot write session to /tmp/vufind_sessions/sess_6tqqpq6138tu0uc2l5lf1am408