Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design

博士 === 國立交通大學 === 電子研究所 === 75 ===

Bibliographic Details
Main Authors:	Chen, Qiu-Feng, 陳秋峰
Other Authors:	Wu, Qing-Yuan
Format:	Others
Language:	zh-TW
Published:	1986
Online Access:	http://ndltd.ncl.edu.tw/handle/97724946981133596561

id	ndltd-TW-075NCTU4430003
record_format	oai_dc
spelling	ndltd-TW-075NCTU44300032016-02-12T04:10:35Z http://ndltd.ncl.edu.tw/handle/97724946981133596561 Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design 在單/複晶矽上熱成長之氧化矽膜的模擬與分析及其在FLOTOXEEPROM元件設計上的應用 Chen, Qiu-Feng 陳秋峰博士國立交通大學電子研究所 75 Wu, Qing-Yuan 吳慶源 1986 學位論文 ; thesis 204 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	博士 === 國立交通大學 === 電子研究所 === 75 ===
author2	Wu, Qing-Yuan
author_facet	Wu, Qing-Yuan Chen, Qiu-Feng 陳秋峰
author	Chen, Qiu-Feng 陳秋峰
spellingShingle	Chen, Qiu-Feng 陳秋峰 Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
author_sort	Chen, Qiu-Feng
title	Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
title_short	Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
title_full	Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
title_fullStr	Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
title_full_unstemmed	Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design
title_sort	modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in flotox eeprom device design
publishDate	1986
url	http://ndltd.ncl.edu.tw/handle/97724946981133596561
work_keys_str_mv	AT chenqiufeng modelingsandcharacterizationsofthermaloxidefilmsgrownonsinglecrystallinepolycrystallinesiliconandtheirapplicationsinflotoxeepromdevicedesign AT chénqiūfēng modelingsandcharacterizationsofthermaloxidefilmsgrownonsinglecrystallinepolycrystallinesiliconandtheirapplicationsinflotoxeepromdevicedesign AT chenqiufeng zàidānfùjīngxìshàngrèchéngzhǎngzhīyǎnghuàxìmódemónǐyǔfēnxījíqízàiflotoxeepromyuánjiànshèjìshàngdeyīngyòng AT chénqiūfēng zàidānfùjīngxìshàngrèchéngzhǎngzhīyǎnghuàxìmódemónǐyǔfēnxījíqízàiflotoxeepromyuánjiànshèjìshàngdeyīngyòng
_version_	1718186427812937728

Modelings and characterizations of thermal oxide films grown on single crystalline/ polycrystalline silicon and their applications in FLOTOX EEPROM device design

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