Optical Metrology for Directed Self-assembly Patterning Using Mueller Matrix Spectroscopic Ellipsometry Based Scatterometry
<p> The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, lower cost per transistors, and higher transistor density. These developments in the field of semiconductor manufacturing along with the...
| Main Author: | |
|---|---|
| Language: | EN |
| Published: |
State University of New York at Albany
2015
|
| Subjects: | |
| Online Access: | http://pqdtopen.proquest.com/#viewpdf?dispub=3718824 |