Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering

Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering

Bibliographic Details
Main Author: Reed, Amber Nicole
Language:English
Published: Wright State University / OhioLINK 2008
Subjects:
Films
ITO
films and the treated
ITO film
resistivity
Magnetron
Films Deposited
Online Access:http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086
id ndltd-OhioLink-oai-etd.ohiolink.edu-wright1221763086
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spelling ndltd-OhioLink-oai-etd.ohiolink.edu-wright12217630862021-08-03T06:16:58Z Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering Reed, Amber Nicole Films ITO films and the treated ITO film resistivity Magnetron Films Deposited In this work, the effects of a post-deposition RF plasma treatment on indium tin oxide (ITO) thin films prepared with pulsed DC magnetron sputtering in argon were investigated. The parameters of the post-deposition were studied to determine what RF power and gas pressure resulted in the greatest reduction in resistivity in the films while producing the smallest increase in substrate temperature for treatments with both argon and oxygen plasmas. The as-deposited (untreated) films and the treated films were characterized using Raman spectroscopy and X-ray diffraction to determine the effects of the post-deposition treatment on the degree of film crystallization. XPS was used to analyze the chemical composition of the films’ surface. SEM images were taken to observe surface features of the films. The resistivity of the films reached 1.66 * 10<sup>-5</sup> Ω m as-deposited and 6.74*10<sup>-6</sup> Ω m after treatment. 2008-09-26 English text Wright State University / OhioLINK http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086 http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086 unrestricted This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.
collection NDLTD
language English
sources NDLTD
topic Films
ITO
films and the treated
ITO film
resistivity
Magnetron
Films Deposited
spellingShingle Films
ITO
films and the treated
ITO film
resistivity
Magnetron
Films Deposited
Reed, Amber Nicole
Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
author Reed, Amber Nicole
author_facet Reed, Amber Nicole
author_sort Reed, Amber Nicole
title Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
title_short Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
title_full Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
title_fullStr Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
title_full_unstemmed Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering
title_sort characterization of inert gas rf plasma-treated indium tin oxide thin films deposited via pulsed dc magnetron sputtering
publisher Wright State University / OhioLINK
publishDate 2008
url http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086
work_keys_str_mv AT reedambernicole characterizationofinertgasrfplasmatreatedindiumtinoxidethinfilmsdepositedviapulseddcmagnetronsputtering
_version_ 1719433979132641280

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