id ndltd-OhioLink-oai-etd.ohiolink.edu-ucin1467126849
record_format oai_dc
collection NDLTD
language English
sources NDLTD
topic Materials Science
Nanowire
Raman Scattering Spectroscopy
Transient Rayleigh Scattering Spectroscopy
InGaAs
GaAsSb
Gate dependent I-V Characteristics
spellingShingle Materials Science
Nanowire
Raman Scattering Spectroscopy
Transient Rayleigh Scattering Spectroscopy
InGaAs
GaAsSb
Gate dependent I-V Characteristics
Wickramasuriya, Nadeeka Thejanie
Optical and Electrical Characterization of Single Semiconductor Nanowires
author Wickramasuriya, Nadeeka Thejanie
author_facet Wickramasuriya, Nadeeka Thejanie
author_sort Wickramasuriya, Nadeeka Thejanie
title Optical and Electrical Characterization of Single Semiconductor Nanowires
title_short Optical and Electrical Characterization of Single Semiconductor Nanowires
title_full Optical and Electrical Characterization of Single Semiconductor Nanowires
title_fullStr Optical and Electrical Characterization of Single Semiconductor Nanowires
title_full_unstemmed Optical and Electrical Characterization of Single Semiconductor Nanowires
title_sort optical and electrical characterization of single semiconductor nanowires
publisher University of Cincinnati / OhioLINK
publishDate 2016
url http://rave.ohiolink.edu/etdc/view?acc_num=ucin1467126849
work_keys_str_mv AT wickramasuriyanadeekathejanie opticalandelectricalcharacterizationofsinglesemiconductornanowires
_version_ 1719440309781266432
spelling ndltd-OhioLink-oai-etd.ohiolink.edu-ucin14671268492021-08-03T06:37:07Z Optical and Electrical Characterization of Single Semiconductor Nanowires Wickramasuriya, Nadeeka Thejanie Materials Science Nanowire Raman Scattering Spectroscopy Transient Rayleigh Scattering Spectroscopy InGaAs GaAsSb Gate dependent I-V Characteristics <p>Strain distribution in the core and the shell of a semiconductor nanowire (NW) and its effect on band structures including carrier recombination dynamics of individual Wurtzite (WZ) In<sub>1-x</sub>Ga<sub>x</sub>As/InP and Zincblende (ZB) GaAs<sub>1-x</sub>Sb<sub>x</sub>/InP strained core-shell NWs are investigated using room temperature Raman scattering and transient Rayleigh scattering (TRS) optical spectroscopy techniques. In addition, the electrical transport properties of individual ZB InP NWs are explored using gate-dependent current-voltage (I-V) measurements.</p><p>Micro-Raman scattering from individual In<sub>1-x</sub>Ga<sub>x</sub>As NWs show InAs like TO and GaAs like TO modes with frequencies which are consistent with the 35% Ga concentration determined from the growth parameters. Calculations showed that the In<sub>0.65</sub>Ga<sub>0.35</sub>As core is under compressive strain of 0.26% while the InP shell is in tensile strain of 0.42% in In<sub>0.65</sub>Ga<sub>0.35</sub>As/InP NWs. TRS measurements of single NWs show clear evidence for a strong band resonance in the WZ In<sub>0.65</sub>Ga<sub>0.35</sub>As NW at 0.819 eV which is estimated to be a ~186 meV blue-shift with respect to bulk ZB In<sub>0.65</sub>Ga<sub>0.35</sub>As. Furthermore, both Raman scattering and TRS measurements are on excellent agreement with the band gap shift of In<sub>0.65</sub>Ga<sub>0.35</sub>As/InP core-shell NWs with respect to the core only NW by 46~48 meV which experimentally confirmed the InP shell induced compression of the core. The time decays of the resonance are observed to be long (~125 ps) for core-shell NWs while it is short (~31 ps) for core only NWs consistent with a larger nonradiative recombination rate.</p><p>Optical phonon modes of GaAs<sub>1-x</sub>Sb<sub>x</sub> are observed to be red-shifted with increasing Antimony fraction in GaAs<sub>1-x</sub>Sb<sub>x</sub> NWs which can be expected in an alloy with increasing concentration of a heavier atom in the lattice. Using TRS measurements, the GaAs<sub>0.71</sub>Sb<sub>0.29</sub> band gap for the core-shell NW is observed to be reduced by 0.04 eV with respect to the core only NW because of the tensile strain in the core. Raman experiments show a blue-shift of the InP phonons and a red-shift of the GaAs<sub>1-x</sub>Sb<sub>x</sub> phonons in individual GaAs<sub>0.71</sub>Sb<sub>0.29</sub>/InP NWs, which is consistent with the tensile core strain inferred from TRS results. The recombination life times in GaAs<sub>0.71</sub>Sb<sub>0.29</sub>, GaAs<sub>0.71</sub>Sb<sub>0.29</sub>/InP NWs are found to be 31 ps and 127 ps respectively reflecting the effectiveness of the InP shell surface passivation.</p> <p>Individual InP NW field effect transistors are fabricated using photolithography to investigate the electrical transport properties of InP NWs. Gate-dependent I-V plots showed that the InP NWs are n-type and displayed typical non-Ohmic behavior due to the contact resistance between NW and metal electrodes. Carrier mobility determined for the InP NWs is as high as 655 cm<sup>2</sup>/(V.s) for the carrier density of 4.08 x 10<sup>17</sup> cm<sup>-3</sup> which is comparable to n-type InP thin film materials with similar carrier densities. An equivalent circuit model of the metal-semiconductor-metal structure is used to extract the carrier density and mobility of the NW as 1.00 x 10<sup>17</sup> cm<sup>-3</sup> and 511 cm<sup>2</sup>/(V.s). This model makes it possible to determine the barrier heights of the NW device while providing a good agreement with the experimental results.</p> 2016-10-10 English text University of Cincinnati / OhioLINK http://rave.ohiolink.edu/etdc/view?acc_num=ucin1467126849 http://rave.ohiolink.edu/etdc/view?acc_num=ucin1467126849 unrestricted This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.