Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists

Bibliographic Details
Main Author:	Cole, Robert Lawrence
Language:	English
Published:	University of Cincinnati / OhioLINK 2004
Subjects:	Excimer Laser Ablation Lithography Cylindrical Microfabrication
Online Access:	http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859

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spelling	ndltd-OhioLink-oai-etd.ohiolink.edu-ucin10930338592021-08-03T06:10:00Z Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists Cole, Robert Lawrence Excimer Laser Ablation Lithography Cylindrical Microfabrication This work presents development and establishment of excimer laser ablation microlithography for processing difficult cylindrical substrates. Preliminary excimer laser ablation microlithography work was performed on glass planar substrates with thick photoresist over a thin metal layer. Laser system parameters were investigated and optimized for patterning thick photoresist without damaging the underlying thin metal layer. Metallic microstructures were realized by electroplating through the laser ablation patterned thick photoresist mold and onto the thin seed metal layer. Cylindrical substrate processing capability was accomplished by adding and optimizing the following equipment: dip coating module, horizontal axis rotation unit for electron-beam evaporation metallization, high precision lathe, and modified electroplating system. Electroplated metallic microstructures were successfully realized onto cylindrical substrates after patterning thick photoresist with a precision lathe and by excimer laser ablation. The excimer laser ablation microlithography developed and established in this work will provide researchers with new capabilities to fabricate metallic microstructures for novel microdevices on cylindrical substrates. 2004-10-07 English text University of Cincinnati / OhioLINK http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859 http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859 unrestricted This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.
collection	NDLTD
language	English
sources	NDLTD
topic	Excimer Laser Ablation Lithography Cylindrical Microfabrication
spellingShingle	Excimer Laser Ablation Lithography Cylindrical Microfabrication Cole, Robert Lawrence Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
author	Cole, Robert Lawrence
author_facet	Cole, Robert Lawrence
author_sort	Cole, Robert Lawrence
title	Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
title_short	Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
title_full	Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
title_fullStr	Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
title_full_unstemmed	Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists
title_sort	precision excimer laser lithography for cylindrical substrates with thick photoresists
publisher	University of Cincinnati / OhioLINK
publishDate	2004
url	http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859
work_keys_str_mv	AT colerobertlawrence precisionexcimerlaserlithographyforcylindricalsubstrateswiththickphotoresists
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Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists

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