Multi-scale Simulations of Thin-Film Metal Epitaxial Growth

Multi-scale Simulations of Thin-Film Metal Epitaxial Growth

Bibliographic Details
Main Author: Borovikov, Valery V.
Language:English
Published: University of Toledo / OhioLINK 2008
Subjects:
Physics
multi-scale
deposition angle
epitaxial thin-film metal growth
Cu/Cu(100)
kinetic Monte Carlo
molecular dynamics
Online Access:http://rave.ohiolink.edu/etdc/view?acc_num=toledo1216928358
id ndltd-OhioLink-oai-etd.ohiolink.edu-toledo1216928358
record_format oai_dc
spelling ndltd-OhioLink-oai-etd.ohiolink.edu-toledo12169283582021-08-03T06:07:17Z Multi-scale Simulations of Thin-Film Metal Epitaxial Growth Borovikov, Valery V. Physics multi-scale deposition angle epitaxial thin-film metal growth Cu/Cu(100) kinetic Monte Carlo molecular dynamics <p>The main objective of the work presented in this thesis is tocontribute to the understanding of how the growth conditions mayaffect the surface morphology during deposition. In thin filmgrowth physical processes in a very wide range of time and lengthscales are relevant. A set of quite different methods of modelingis required when aiming at a more or less complete realisticpicture of the growth process. Accordingly, both computersimulations/modeling and analytic calculations were employed inour studies of thin film growth. In particular, a hybridmulti-scale model, which combines a kinetic Monte Carlo (KMC) simulationfor the thermal surface diffusion with a Molecular Dynamics (MD)simulation of deposition events, was developed and successfullyemployed to study Cu/Cu(100) growth at a range of substratetemperatures and deposition angles. Predictive capabilities ofthis model allowed us to explain a number of puzzling experimentalobservations.</p><p>Another accomplishment presented in this thesis isan analytic calculation of the surface current and selected moundangle for the case of epitaxial growth on fcc(111) surface. Theresults of this calculation help to understand the morphologiesobserved experimentally for a wide range of systems and depositionconditions.</p> 2008-09-30 English text University of Toledo / OhioLINK http://rave.ohiolink.edu/etdc/view?acc_num=toledo1216928358 http://rave.ohiolink.edu/etdc/view?acc_num=toledo1216928358 unrestricted This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.
collection NDLTD
language English
sources NDLTD
topic Physics
multi-scale
deposition angle
epitaxial thin-film metal growth
Cu/Cu(100)
kinetic Monte Carlo
molecular dynamics
spellingShingle Physics
multi-scale
deposition angle
epitaxial thin-film metal growth
Cu/Cu(100)
kinetic Monte Carlo
molecular dynamics
Borovikov, Valery V.
Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
author Borovikov, Valery V.
author_facet Borovikov, Valery V.
author_sort Borovikov, Valery V.
title Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
title_short Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
title_full Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
title_fullStr Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
title_full_unstemmed Multi-scale Simulations of Thin-Film Metal Epitaxial Growth
title_sort multi-scale simulations of thin-film metal epitaxial growth
publisher University of Toledo / OhioLINK
publishDate 2008
url http://rave.ohiolink.edu/etdc/view?acc_num=toledo1216928358
work_keys_str_mv AT borovikovvaleryv multiscalesimulationsofthinfilmmetalepitaxialgrowth
_version_ 1719431266330214400

Similar Items