Charge conduction, trapping and dielectric degradation in stacked silicon nitride-silicon dioxide insulating films /

Charge conduction, trapping and dielectric degradation in stacked silicon nitride-silicon dioxide insulating films /

Bibliographic Details
Main Author:	Chau, Robert Shu-Keung
Language:	English
Published:	The Ohio State University / OhioLINK 1989
Subjects:	Engineering
Online Access:	http://rave.ohiolink.edu/etdc/view?acc_num=osu148759996359414

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