Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas

Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas

Bibliographic Details
Main Authors: Nagai, Hisao, Takashima, Seigou, Hiramatsu, Mineo, Hori, Masaru, Goto, Toshio
Language:en
Published: American Institute of Physics 2002
Online Access:http://dx.doi.org/10.1063/1.1435825
http://hdl.handle.net/2237/7041
id ndltd-NAGOYA-oai-ir.nul.nagoya-u.ac.jp-2237-7041
record_format oai_dc
spelling ndltd-NAGOYA-oai-ir.nul.nagoya-u.ac.jp-2237-70412013-06-26T03:21:01ZBehavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmasNagai, HisaoTakashima, SeigouHiramatsu, MineoHori, MasaruGoto, ToshioAmerican Institute of Physics2002-03-01Article(publisher)http://dx.doi.org/10.1063/1.1435825http://hdl.handle.net/2237/70410021-8979Journal of Applied Physics. v.91, n.5, 2002, p.2615-2621enCopyright (2002) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
collection NDLTD
language en
sources NDLTD
author Nagai, Hisao
Takashima, Seigou
Hiramatsu, Mineo
Hori, Masaru
Goto, Toshio
spellingShingle Nagai, Hisao
Takashima, Seigou
Hiramatsu, Mineo
Hori, Masaru
Goto, Toshio
Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
author_facet Nagai, Hisao
Takashima, Seigou
Hiramatsu, Mineo
Hori, Masaru
Goto, Toshio
author_sort Nagai, Hisao
title Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
title_short Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
title_full Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
title_fullStr Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
title_full_unstemmed Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
title_sort behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density n_2/h_2 and n_2/nh_3 plasmas
publisher American Institute of Physics
publishDate 2002
url http://dx.doi.org/10.1063/1.1435825
http://hdl.handle.net/2237/7041
work_keys_str_mv AT nagaihisao behaviorofatomicradicalsandtheireffectsonorganiclowdielectricconstantfilmetchinginhighdensityn2h2andn2nh3plasmas
AT takashimaseigou behaviorofatomicradicalsandtheireffectsonorganiclowdielectricconstantfilmetchinginhighdensityn2h2andn2nh3plasmas
AT hiramatsumineo behaviorofatomicradicalsandtheireffectsonorganiclowdielectricconstantfilmetchinginhighdensityn2h2andn2nh3plasmas
AT horimasaru behaviorofatomicradicalsandtheireffectsonorganiclowdielectricconstantfilmetchinginhighdensityn2h2andn2nh3plasmas
AT gototoshio behaviorofatomicradicalsandtheireffectsonorganiclowdielectricconstantfilmetchinginhighdensityn2h2andn2nh3plasmas
_version_ 1716589684119830528

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