Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N_2/H_2 and N_2/NH_3 plasmas
| Main Authors: | , , , , |
|---|---|
| Language: | en |
| Published: |
American Institute of Physics
2002
|
| Online Access: | http://dx.doi.org/10.1063/1.1435825 http://hdl.handle.net/2237/7041 |
| Description not available. |