Studies on Plasma Etching Process of Low Dielectrics for Fine Pattern Profile Control with Less Damage

名古屋大学博士学位論文学位の種類:博士(工学) (課程) 学位授与年月日:平成24年3月26日

Bibliographic Details
Main Authors:	山本, 洋, YAMAMOTO, Hiroshi
Language:	en
Published:	2012
Online Access:	http://hdl.handle.net/2237/16473

Similar Items

Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy
by: Rimal, Sirish
Published: (2016)

Plasma damaging process of porous ultra-low-k dielectrics and dielectric repair
by: Huang, Huai, Ph. D.
Published: (2012)

Non-perfluorocompound chemistries for plasma etching of dielectrics
by: Tao, Benjamin A. (Benjamin Albert)
Published: (2008)

The Study of Patterning Dielectric Layer by Spray Etch Technique
by: Chung, Hsing-Teng, et al.
Published: (2011)

Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment
by: Calvo, Jesús, et al.
Published: (2016)

Mechanistic study of plasma damage to porous low-k : process development and dielectric recovery
by: Shi, Hualiang
Published: (2010)

Pattern dependencies in the plasma etching of polysilicon
by: Dalton, Timothy Joseph
Published: (2005)

The Role of The Plasma Etching Process on The Polyimide Etching Equipment
by: Sheng - Hsiung Ou, et al.
Published: (2012)

Application of Thin Gate Oxide Process to Improve Plasma Etching Induced Damage
by: Tzeng, Pei-Jer, et al.
Published: (1997)

Low pressure plasma voltage process for transformer couplingplasma etching
by: Wei-Pin Lee, et al.

Atmospheric He/O2 plasma jet fine etching with a scanning probe microscope
by: Kenta Nakazawa, et al.
Published: (2020-09-01)

Study on Etching of Ultra Low-k Dielectric Constant Materials
by: tzu-hsien chang, et al.
Published: (2005)

On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas
by: Bishal Kafle, et al.
Published: (2020-11-01)

The Interactions of Plasma with Low-k Dielectrics: Fundamental Damage and Protection Mechanisms
by: Behera, Swayambhu Prasad
Published: (2011)

Low damage etching and deposition of electronic materials with a novel radio frequency plasma source
by: Beckman, Judith
Published: (1996)

In-Situ Repair Plasma-Induced Damage and Cap Dielectric Barrier for Porous Low-Dielectric-Constant Materials by HMDS Plasma Treatment
by: Chih-Yen Lee, et al.
Published: (2021-03-01)

Development of novel alternative chemistry processes for dielectric etch applications
by: Karecki, Simon Martin
Published: (2005)

Plasma Physics Model Simulation of Plasma Etching Process
by: 楊智昇
Published: (2001)

Test Pattern Design for Plasma Induced Damage on Inter-Metal Dielectric in FinFET Cu BEOL Processes
by: Chi Su, et al.
Published: (2020-05-01)

Etching kinetics and surface roughening of polysilicon and dielectric materials in inductively coupled plasma beams
by: Yin, Yunpeng, Ph. D. Massachusetts Institute of Technology
Published: (2009)

Low-Damage and Self-Limiting (Al)GaN Etching Process through Atomic Layer Etching using O<sub>2</sub> and BCl<sub>3</sub> Plasma
by: Il-Hwan Hwang, et al.
Published: (2021-02-01)

Gate Oxide Charging Damage Induced by Poly Gate Plasma Etching
by: Jiang, Jane-Long, et al.
Published: (1997)

Preparation and Dry Etching Characteristics of Low Dielectric Constant Materials for ULSI Applications
by: Chi-Hung Liu, et al.
Published: (2000)

Studies on Dry Etch of Low Dielectric Constant Nanoporous Silica Thin Films
by: Ji-Feng Liu, et al.
Published: (2006)

Multivariate endpoint detection of plasma etching processes
by: Goodlin, Brian E., 1974-
Published: (2005)

Hydrogen-based plasma etch of copper at low temperature
by: Wu, Fangyu
Published: (2012)

Fabrication of Patterned Sapphire Substrates by High-Density-Plasma Etching
by: Shih-feng Pai, et al.
Published: (2004)

Characterization and modeling of pattern dependencies and time evolution in plasma etching
by: Farahanchi, Ali
Published: (2010)

Characterization and modeling of plasma etch pattern dependencies in integrated circuits
by: Abrokwah, Kwaku O
Published: (2007)

Non-perfluorocompound chemistries for dielectric etching applications
by: Pruette, Laura C. (Laura Catherine), 1974-
Published: (2009)

Evaluation of unsaturated fluorocarbons for dielectric Etch applications
by: Chatterjee, Ritwik, 1974-
Published: (2014)

FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials
by: Adam Pander, et al.
Published: (2017-04-01)

Etching Characteristic of the Organic Low Dielectric Constant Material a-C:F Film
by: Wu Yu-Hen, et al.
Published: (2001)

Nanostructure etching with plasmas
by: Zachariasse, Jacobus Marinus Frans
Published: (1995)

Simulation of Plasma Etching
by: Lin Jr Jung, et al.
Published: (2001)

Process and reliability assessment of plasma-based copper etch process
by: Liu, Guojun
Published: (2010)

Control of Plasma Etching of Semiconductor Surfaces
by: Zhu, Hongbin
Published: (2005)

Factors controlling etch anisotropy in plasmas
by: Robertson, C. J.
Published: (1990)

Investigation of Defects Induced by Plasma Dry Etch Processes
by: 劉嘉群
Published: (2016)

RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
by: T. A. Ismailov, et al.
Published: (2016-07-01)