Nodal photolithography : lithography via far-field optical nodes in the resist
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2008. === Includes bibliographical references (p. 53-54). === In this thesis, I investigate one approach - stimulated emission depletion - to surmounting the diffraction limitation of optical...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2008
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| Online Access: | http://hdl.handle.net/1721.1/43065 |