The ion-beam reactive sputtering process for deposition of niobium nitride thin films

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. === Vita. === Includes bibliographical references (leaves 284-290). === by Daniel Jenner Lichtenwalner. === Ph.D.

Bibliographic Details
Main Author:	Lichtenwalner, Daniel Jenner
Other Authors:	David A. Rudman and Alfredo C. Anderson.
Format:	Others
Language:	English
Published:	Massachusetts Institute of Technology 2008
Subjects:	Materials Science and Engineering
Online Access:	http://hdl.handle.net/1721.1/42466

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spelling	ndltd-MIT-oai-dspace.mit.edu-1721.1-424662019-05-02T16:32:36Z The ion-beam reactive sputtering process for deposition of niobium nitride thin films Lichtenwalner, Daniel Jenner David A. Rudman and Alfredo C. Anderson. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering Materials Science and Engineering Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. Vita. Includes bibliographical references (leaves 284-290). by Daniel Jenner Lichtenwalner. Ph.D. 2008-09-03T15:45:05Z 2008-09-03T15:45:05Z 1990 1990 Thesis http://hdl.handle.net/1721.1/42466 24250339 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 2 v. (329 leaves) application/pdf Massachusetts Institute of Technology
collection	NDLTD
language	English
format	Others
sources	NDLTD
topic	Materials Science and Engineering
spellingShingle	Materials Science and Engineering Lichtenwalner, Daniel Jenner The ion-beam reactive sputtering process for deposition of niobium nitride thin films
description	Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. === Vita. === Includes bibliographical references (leaves 284-290). === by Daniel Jenner Lichtenwalner. === Ph.D.
author2	David A. Rudman and Alfredo C. Anderson.
author_facet	David A. Rudman and Alfredo C. Anderson. Lichtenwalner, Daniel Jenner
author	Lichtenwalner, Daniel Jenner
author_sort	Lichtenwalner, Daniel Jenner
title	The ion-beam reactive sputtering process for deposition of niobium nitride thin films
title_short	The ion-beam reactive sputtering process for deposition of niobium nitride thin films
title_full	The ion-beam reactive sputtering process for deposition of niobium nitride thin films
title_fullStr	The ion-beam reactive sputtering process for deposition of niobium nitride thin films
title_full_unstemmed	The ion-beam reactive sputtering process for deposition of niobium nitride thin films
title_sort	ion-beam reactive sputtering process for deposition of niobium nitride thin films
publisher	Massachusetts Institute of Technology
publishDate	2008
url	http://hdl.handle.net/1721.1/42466
work_keys_str_mv	AT lichtenwalnerdanieljenner theionbeamreactivesputteringprocessfordepositionofniobiumnitridethinfilms AT lichtenwalnerdanieljenner ionbeamreactivesputteringprocessfordepositionofniobiumnitridethinfilms
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The ion-beam reactive sputtering process for deposition of niobium nitride thin films

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