The ion-beam reactive sputtering process for deposition of niobium nitride thin films

The ion-beam reactive sputtering process for deposition of niobium nitride thin films

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. === Vita. === Includes bibliographical references (leaves 284-290). === by Daniel Jenner Lichtenwalner. === Ph.D.

Bibliographic Details
Main Author: Lichtenwalner, Daniel Jenner
Other Authors: David A. Rudman and Alfredo C. Anderson.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2008
Subjects:
Materials Science and Engineering
Online Access:http://hdl.handle.net/1721.1/42466

Internet

http://hdl.handle.net/1721.1/42466

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