Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. === Includes bibliographical references (leaves 76-77). === by Jeffrey Wade Thomas. === M.S.
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ndltd-MIT-oai-dspace.mit.edu-1721.1-380622019-05-02T16:13:01Z Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes Thomas, Jeffrey Wade James E. Chung. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science Electrical Engineering and Computer Science Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. Includes bibliographical references (leaves 76-77). by Jeffrey Wade Thomas. M.S. 2007-07-18T13:31:08Z 2007-07-18T13:31:08Z 1995 1995 Thesis http://hdl.handle.net/1721.1/38062 33342500 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 127 leaves application/pdf Massachusetts Institute of Technology |
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English |
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Others
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Electrical Engineering and Computer Science |
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Electrical Engineering and Computer Science Thomas, Jeffrey Wade Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
description |
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. === Includes bibliographical references (leaves 76-77). === by Jeffrey Wade Thomas. === M.S. |
author2 |
James E. Chung. |
author_facet |
James E. Chung. Thomas, Jeffrey Wade |
author |
Thomas, Jeffrey Wade |
author_sort |
Thomas, Jeffrey Wade |
title |
Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
title_short |
Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
title_full |
Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
title_fullStr |
Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
title_full_unstemmed |
Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes |
title_sort |
characterization of locos and oxidized mesa isolation in deep-sub micrometer soi nmos processes |
publisher |
Massachusetts Institute of Technology |
publishDate |
2007 |
url |
http://hdl.handle.net/1721.1/38062 |
work_keys_str_mv |
AT thomasjeffreywade characterizationoflocosandoxidizedmesaisolationindeepsubmicrometersoinmosprocesses |
_version_ |
1719036352965640192 |