Highly absorptive thin films for integrated photonic devices

Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006. === This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. === Includes bibliographical ref...

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Main Author: Bradley, Michael Scott
Other Authors: Vladimir Bulović.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2007
Subjects:
Online Access:http://hdl.handle.net/1721.1/36394
id ndltd-MIT-oai-dspace.mit.edu-1721.1-36394
record_format oai_dc
spelling ndltd-MIT-oai-dspace.mit.edu-1721.1-363942019-05-02T16:24:37Z Highly absorptive thin films for integrated photonic devices Bradley, Michael Scott Vladimir Bulović. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006. This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. Includes bibliographical references (p. 52-53). Highly absorptive thin films serve as the active layer of a new class of photonic devices based on the strong coupling of light and matter. In order to develop these devices into a new field of integrated photonics, methods for analysis, patterning, and deposition of the active layer are necessary. This thesis develops these methods and applies them to thin films of J-aggregates grown in a layer-by-layer (LBL) process, which have been shown to have remarkable optical and morphological properties and have recently enabled the demonstration of strong coupling between light and matter in an electroluminescent device at room temperature. J-aggregate thin films are analyzed using Kramers-Kronig regression to determine their complex index of refraction, an important parameter involved in photonic device design. Additionally, a soft lithography method is demonstrated for patterning and deposition of LBL J-aggregate thin films. Together, these methods can be used to further enable integrated photonics based on the strong coupling of light and matter. by Michael Scott Bradley. M.Eng. 2007-03-09T18:54:49Z 2007-03-09T18:54:49Z 2006 2006 Thesis http://hdl.handle.net/1721.1/36394 79629159 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 53 p. application/pdf Massachusetts Institute of Technology
collection NDLTD
language English
format Others
sources NDLTD
topic Electrical Engineering and Computer Science.
spellingShingle Electrical Engineering and Computer Science.
Bradley, Michael Scott
Highly absorptive thin films for integrated photonic devices
description Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006. === This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. === Includes bibliographical references (p. 52-53). === Highly absorptive thin films serve as the active layer of a new class of photonic devices based on the strong coupling of light and matter. In order to develop these devices into a new field of integrated photonics, methods for analysis, patterning, and deposition of the active layer are necessary. This thesis develops these methods and applies them to thin films of J-aggregates grown in a layer-by-layer (LBL) process, which have been shown to have remarkable optical and morphological properties and have recently enabled the demonstration of strong coupling between light and matter in an electroluminescent device at room temperature. J-aggregate thin films are analyzed using Kramers-Kronig regression to determine their complex index of refraction, an important parameter involved in photonic device design. Additionally, a soft lithography method is demonstrated for patterning and deposition of LBL J-aggregate thin films. Together, these methods can be used to further enable integrated photonics based on the strong coupling of light and matter. === by Michael Scott Bradley. === M.Eng.
author2 Vladimir Bulović.
author_facet Vladimir Bulović.
Bradley, Michael Scott
author Bradley, Michael Scott
author_sort Bradley, Michael Scott
title Highly absorptive thin films for integrated photonic devices
title_short Highly absorptive thin films for integrated photonic devices
title_full Highly absorptive thin films for integrated photonic devices
title_fullStr Highly absorptive thin films for integrated photonic devices
title_full_unstemmed Highly absorptive thin films for integrated photonic devices
title_sort highly absorptive thin films for integrated photonic devices
publisher Massachusetts Institute of Technology
publishDate 2007
url http://hdl.handle.net/1721.1/36394
work_keys_str_mv AT bradleymichaelscott highlyabsorptivethinfilmsforintegratedphotonicdevices
_version_ 1719039860590772224