Metrology of very thin silicon epitaxial films
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998. === Includes bibliographical references (p. 161-169). === In this thesis, non-destructive thickness measurement of sub-0.5 µm silicon epitaxial films has been successfully performed using spectro...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/17469 |