Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects

Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects

Thesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992. === Includes bibliographical references (leaves 246-262). === by Hai Pham Longworth. === Sc.D.

Bibliographic Details
Main Author: Longworth, Hai Pham
Other Authors: Carl V. Thompson.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2005
Subjects:
Materials Science and Engineering
Online Access:http://hdl.handle.net/1721.1/13114

Internet

http://hdl.handle.net/1721.1/13114

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