Highly coherent gratings for optoelectronics : an application of spatial-phase-locked electron beam lithography
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. === Includes bibliographical references (leaves 75-79). === by Juan Ferrera. === M.S.
Main Author: | Ferrera, Juan (Ferrera Uranga) |
---|---|
Other Authors: | Henry I. Smith. |
Format: | Others |
Language: | English |
Published: |
Massachusetts Institute of Technology
2005
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/12030 |
Similar Items
-
Nanometer-scale placement in electron-beam lithography
by: Ferrera, Juan (Ferrera Uranga)
Published: (2005) -
Real-time spatial-phase-locked electron-beam lithography
by: Zhang, Feng, 1973-
Published: (2008) -
Low-voltage spatial-phase-locked scanning-electron-beam lithography
by: Cheong, Lin Lee
Published: (2010) -
Development of a scintillating reference grid for spatial-phase-locked electron-beam lithography
by: Finlayson, Mark Alan, 1977-
Published: (2005) -
Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)
by: Caramana, Cynthia L. (Cynthia Louise), 1978-
Published: (2005)